Search results

Search for "contact lithography" in Full Text gives 2 result(s) in Beilstein Journal of Nanotechnology.

Integrated photonics multi-waveguide devices for optical trapping and Raman spectroscopy: design, fabrication and performance demonstration

  • Gyllion B. Loozen,
  • Arnica Karuna,
  • Mohammad M. R. Fanood,
  • Erik Schreuder and
  • Jacob Caro

Beilstein J. Nanotechnol. 2020, 11, 829–842, doi:10.3762/bjnano.11.68

Graphical Abstract
  • (the typical medium in our experiments) for various waveguide thicknesses using the 3D finite-difference time-domain (FDTD) method with Lumerical’s FDTD solutions [10]. We choose a waveguide width wexc of 1 μm, which is the minimum width for the contact lithography we use. We aim for single-mode
PDF
Album
Supp Info
Full Research Paper
Published 27 May 2020

Near-field photochemical and radiation-induced chemical fabrication of nanopatterns of a self-assembled silane monolayer

  • Ulrich C. Fischer,
  • Carsten Hentschel,
  • Florian Fontein,
  • Linda Stegemann,
  • Christiane Hoeppener,
  • Harald Fuchs and
  • Stefanie Hoeppener

Beilstein J. Nanotechnol. 2014, 5, 1441–1449, doi:10.3762/bjnano.5.156

Graphical Abstract
  • highly localized shadow. The removal of the gold mask reveals the SAM nanopattern. Keywords: colloid lithography; contact lithography; near-field; photochemistry; self-assembled silane monolayers; Introduction Chemical nanopatterns consist of spatially separated areas providing different chemically
PDF
Album
Full Research Paper
Published 03 Sep 2014
Other Beilstein-Institut Open Science Activities